Mechano-oxidation during cobalt polishing
By Xu, Wenhu; Ma, Lian; Chen, Yan; Liang, Hong
Published in Wear
2018
Abstract
The synergetic effects of chemical-mechanical interactions are key to generate atomically flat surfaces during polishing. The mechanisms need to be further understood. Here we report the influence of pH values on chemical-mechanical interactions during cobalt chemical-mechanical polishing (CMP). Using an in situ approach combining polishing and electrochemical measurement, we found that the single frequency electrochemical impendence Z value reflected the nature and thickness of the surface oxide. Specifically, the oxide thickness grew when the pH was increased from 5.0 to 8.0 and reduced while in 8.0
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