The effect of plasma nitriding temperature on the electrochemical and semiconducting properties of thin passive films formed on 316 L stainless steel implant material in \SBF\ solution
By M. Yaz?c? and O.
Published in Surface and Coatings Technology
NULL
2015
Abstract
In this study, 316 L stainless steel samples were nitrided plasma at temperatures of 350, 400 and 450
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