Structural, optical and electrochemical properties of TiO2 thin films grown by APCVD method
By Quiñonez, C.; Vallejo, W. & Gordillo, G.
Published in Applied Surface Science
NULL
2010
Abstract
Atmospheric pressure chemical vapor deposition (APCVD) of TiO2 thin films has been achieved onto glass and onto ITO-coated glass substrates, from the reaction of TiCl4 with ethyl acetate (EtOAc). The effect of the synthesis temperature on the optical, structural and electrochemical properties was studied through spectral transmittance, X-ray diffraction (XRD) and electrochemical impedance spectroscopy (EIS) measurements. It was established that the TiO2 films deposited onto glass substrate, at temperatures greater than 400 °C grown with rutile type tetragonal structure, whereas the TiO2 films deposited onto ITO-coated glass substrate grown with anatase type structure. EIS was applied as suitable method to determine the charge transfer resistance in the electrolyte/TiO2 interface, typically found in dye-sensitized solar cells.
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